Evaluation of Alternative Atomistic Models for the Incipient Growth of ZnO by Atomic Layer Deposition - Aix-Marseille Université Access content directly
Journal Articles Journal of Electronic Materials Year : 2017

Evaluation of Alternative Atomistic Models for the Incipient Growth of ZnO by Atomic Layer Deposition

Toufik Ouled
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Sabine Lay
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  • IdHAL : sabine-lay
Dillon Fong
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hal-01705058 , version 1 (09-02-2018)

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Manh-Hung Chu, Liang Tian, Ahmad Chaker, Evgenii Skopin, Valentina Cantelli, et al.. Evaluation of Alternative Atomistic Models for the Incipient Growth of ZnO by Atomic Layer Deposition. Journal of Electronic Materials, 2017, 46 (6), pp.3512 - 3517. ⟨10.1007/s11664-017-5448-2⟩. ⟨hal-01705058⟩
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