Subnanometric Si film reactive diffusion on Ni - Aix-Marseille Université Access content directly
Journal Articles Applied Physics Letters Year : 2009

Subnanometric Si film reactive diffusion on Ni

No file

Dates and versions

hal-02044925 , version 1 (21-02-2019)

Identifiers

  • HAL Id : hal-02044925 , version 1

Cite

A. Portavoce, B. Lalmi, G. Tréglia, Christophe Girardeaux, Dominique Mangelinck, et al.. Subnanometric Si film reactive diffusion on Ni. Applied Physics Letters, 2009, 95 (2), pp.023111. ⟨hal-02044925⟩
42 View
0 Download

Share

Gmail Facebook X LinkedIn More