Measurement of As diffusivity in Ni2Si thin films - Aix-Marseille Université Access content directly
Journal Articles Microelectronic Engineering Year : 2010

Dates and versions

hal-02386115 , version 1 (29-11-2019)

Identifiers

Cite

I. Blum, A. Portavoce, D. Mangelinck, R. Daineche, K. Hoummada, et al.. Measurement of As diffusivity in Ni2Si thin films. Microelectronic Engineering, 2010, 87 (3), pp.263-266. ⟨10.1016/j.mee.2009.05.020⟩. ⟨hal-02386115⟩
53 View
0 Download

Altmetric

Share

Gmail Facebook X LinkedIn More