Subnanometric Si film reactive diffusion on Ni - Aix-Marseille Université Access content directly
Journal Articles Applied Physics Letters Year : 2009
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hal-02386120 , version 1 (29-11-2019)

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A. Portavoce, B. Lalmi, G. Tréglia, C. Girardeaux, D. Mangelinck, et al.. Subnanometric Si film reactive diffusion on Ni. Applied Physics Letters, 2009, 95 (2), pp.023111. ⟨10.1063/1.3177187⟩. ⟨hal-02386120⟩
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