In-situ interferometric monitoring of optical coatings
Résumé
We present a new method for the in situ measurement of the amplitude and phase of the reflection coefficient of a plane substrate installed in a mechanical holder rotating at high speed (120 turns per minute) during the deposition of an optical thin-film stack. Our method is based on digital holography and uses a self-referenced scheme to cancel the effects of the severe constraints generated by the vibrational and thermal environment of the deposition machine.
Domaines
Optique / photoniqueOrigine | Fichiers produits par l'(les) auteur(s) |
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