Ge condensation for the fabrication of fully strained and defect-free planar Si0.5Ge0.5 layers on silicon
T. David
,
K. Liu
,
Luc Favre
(1)
,
A. Ronda
(1)
,
Marco Abbarchi
,
M. Naffouti
,
J.N. Aqua
,
Isabelle Berbezier
(1)
,
S. Fernandez
,
M.I. Richard
(1)
,
O. Thomas
(1)
T. David
- Function : Author
- PersonId : 746079
- IdHAL : thomas-david
- ORCID : 0000-0002-6796-220X
K. Liu
- Function : Author
Luc Favre
- Function : Author
- PersonId : 5307
- IdHAL : luc-favre
- ORCID : 0000-0002-9010-0085
- IdRef : 086577832
Marco Abbarchi
- Function : Author
- PersonId : 19471
- IdHAL : marco-abbarchi
M. Naffouti
- Function : Author
J.N. Aqua
- Function : Author
S. Fernandez
- Function : Author
M.I. Richard
- Function : Author
- PersonId : 736272
- IdHAL : marie-ingrid-richard
- ORCID : 0000-0002-8172-3141
- IdRef : 130070289