Strain distribution induced in SOI photonic substrate by TSVs, using advanced X- ray nano-diffraction - Aix-Marseille Université Access content directly
Conference Papers Year : 2016

Strain distribution induced in SOI photonic substrate by TSVs, using advanced X- ray nano-diffraction

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hal-01454828 , version 1 (03-02-2017)

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  • HAL Id : hal-01454828 , version 1

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S. Escoubas, B. Vianne, M.I. Richard, V. Fiori, A. Farcy, et al.. Strain distribution induced in SOI photonic substrate by TSVs, using advanced X- ray nano-diffraction. Materials for Advanced Metallization, MAM 2016, Mar 2016, Brussels, Belgium. ⟨hal-01454828⟩
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