Atmospheric Pressure Chemical Vapor Deposition and characterization of TiO2 antireflection coatings for monocrystalline silicon solar cells - Aix-Marseille Université
Conference Papers Year : 2011

Atmospheric Pressure Chemical Vapor Deposition and characterization of TiO2 antireflection coatings for monocrystalline silicon solar cells

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Physics [physics]

Philippe Torchio  : Connect in order to contact the contributor

https://amu.hal.science/hal-01757696

Submitted on : Tuesday, April 3, 2018-7:38:08 PM

Last modification on : Monday, June 10, 2024-4:58:03 PM

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hal-01757696 , version 1 (03-04-2018)

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D. Hocine, M. Pasquinelli, Ludovic Escoubas, P. Torchio, A. Moreau, et al.. Atmospheric Pressure Chemical Vapor Deposition and characterization of TiO2 antireflection coatings for monocrystalline silicon solar cells. 2011 International Conference on Clean Electrical Power (ICCEP) - Proceedings of the ICCEP'2011, IEEE-IES (Industrial Electronics Society), pp. 145-152 (2011)., Jun 2011, Ischia, France. ⟨10.1109/ICCEP.2011.6036368⟩. ⟨hal-01757696⟩

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