In-situ combined X-Ray diffraction and optical curvature measurements to study microstructure and stress induced during the crystallization of GeTe thin films - Aix-Marseille Université Access content directly
Conference Papers Year : 2017

In-situ combined X-Ray diffraction and optical curvature measurements to study microstructure and stress induced during the crystallization of GeTe thin films

M. Gallard
  • Function : Author
M.S. Amara
  • Function : Author
F. Lauraux
  • Function : Author
C. Guichet
  • Function : Author
C. Mocuta
P. Noé
  • Function : Author
C. Sabbione
  • Function : Author
F. Hippert
  • Function : Author
N. Burle
  • Function : Author
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Dates and versions

hal-01781799 , version 1 (30-04-2018)

Identifiers

  • HAL Id : hal-01781799 , version 1

Cite

M. Gallard, M.S. Amara, F. Lauraux, C. Guichet, M.-I. Richard, et al.. In-situ combined X-Ray diffraction and optical curvature measurements to study microstructure and stress induced during the crystallization of GeTe thin films. MAM2017 – Materials for Advanced Metallization Conference, Mar 2017, Dresden, Germany. ⟨hal-01781799⟩
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