Arsenic and phosphorus codiffusion during silicon microelectronic processes - Aix-Marseille Université Access content directly
Journal Articles Thin Solid Films Year : 2010
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hal-02044923 , version 1 (21-02-2019)

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  • HAL Id : hal-02044923 , version 1

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N. Rodriguez, A. Portavoce, J. Delalleau, C. Grosjean, V. Serradeil, et al.. Arsenic and phosphorus codiffusion during silicon microelectronic processes. Thin Solid Films, 2010, 518 (17), pp.5022-5027. ⟨hal-02044923⟩
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