Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge - Aix-Marseille Université Access content directly
Journal Articles Applied Physics Letters Year : 2008
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hal-02044980 , version 1 (21-02-2019)

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  • HAL Id : hal-02044980 , version 1

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Zoltan Balogh, Zoltán Erdélyi, Dezső Beke, Gábor Langer, Attila Csik, et al.. Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge. Applied Physics Letters, 2008, 92 (14), pp.143104. ⟨hal-02044980⟩
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