Arsenic and phosphorus codiffusion during silicon microelectronic processes - Aix-Marseille Université Access content directly
Journal Articles Thin Solid Films Year : 2010

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hal-02386094 , version 1 (29-11-2019)

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N. Rodriguez, A. Portavoce, J. Delalleau, C. Grosjean, V. Serradeil, et al.. Arsenic and phosphorus codiffusion during silicon microelectronic processes. Thin Solid Films, 2010, 518 (17), pp.5022-5027. ⟨10.1016/j.tsf.2010.03.039⟩. ⟨hal-02386094⟩
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