Reactive Diffusion of Thin Si Deposits into Ni (111) - Aix-Marseille Université Access content directly
Journal Articles Defect and Diffusion Forum Year : 2012
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hal-02393979 , version 1 (04-12-2019)

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B. Lalmi, C. Girardeaux, Alain Portavoce, Bernard Aufray, Jean Bernardini. Reactive Diffusion of Thin Si Deposits into Ni (111). Defect and Diffusion Forum, 2012, 323-325, pp.421-426. ⟨10.4028/www.scientific.net/DDF.323-325.421⟩. ⟨hal-02393979⟩
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