Application of static masking technique in Magnetron Sputtering Technology for the production of linearly variable filters - Aix-Marseille Université Access content directly
Journal Articles CEAS Space Journal Year : 2021

Application of static masking technique in Magnetron Sputtering Technology for the production of linearly variable filters

Thomas Begou
  • Function : Author
Frédéric Lemarquis
  • Function : Author
Antonin Moreau
  • Function : Author
Fabien Lemarchand
  • Function : Author
Holger Reus
  • Function : Author
Detlef Arhilger
  • Function : Author
Harro Hagedorn
  • Function : Author
Julien Lumeau

Abstract

Variable filters are key components for compact spectral imagers. In this paper, we present a method for the fabrication of linearly variable filters based on Bühler HELIOS machine (plasma assisted reactive magnetron sputtering). These filters are obtained by producing a variation of the thickness of all the layers of the coating, using adapted masks placed in between the sputtering targets for the low and high refractive index materials and the substrates. Variable band pass filter from 550 nm up to 1000 nm is demonstrated.
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Dates and versions

hal-03407033 , version 1 (28-10-2021)

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Thomas Begou, Frédéric Lemarquis, Antonin Moreau, Fabien Lemarchand, Holger Reus, et al.. Application of static masking technique in Magnetron Sputtering Technology for the production of linearly variable filters. CEAS Space Journal, 2021, ⟨10.1007/s12567-021-00402-3⟩. ⟨hal-03407033⟩
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